iST, a semiconductor verification and analysis manufacturer, announced that it has officially launched the next 2-nanometer generation ALD (Atomic Layer Deposition) new material selection and verification services, which will further extend to the m...
iST, a semiconductor verification and analysis manufacturer, announced that it has officially launched the next 2-nanometer generation ALD (Atomic Layer Deposition) new material selection and verification services, which will further extend to the material selection, coating testing and quality confirmation of chemical materials. This move enables iST not only to act as a wafer verification partner, but also to become a key accelerator for material manufacturers to develop new formulations.
宜特表示，觀察發現晶圓代工大廠、IDM 廠在 2025 年下半年，陸續在 2 奈米、18A 進入量產，均屬立體電晶體架構，對 ALD 設備與新材料需求大幅擴張。 How to uniformly coat a complex 3D structure is the most difficult part. Both traditional CVD and PVD (physical vapor deposition) have limitations in 3D structures. Taking PVD as an example, evaporation or sputtering often fails to cover deep internal areas; CVD easily leads to uneven film thickness due to the fast gas reaction rate.
相較之下，ALD 技術以「原子層逐層沉積」可精準控制膜厚，及其生成的薄膜具高均勻度及覆蓋性優異，被視為2奈米後之先進製程不可或缺的關鍵技術。 However, ALD has slow deposition speed, complex parameters, and the control of reaction conditions of new materials is particularly stringent.宜特推進ALD 新材料驗證平台，可協助材料商在開發階段完成鍍膜實驗，快速評估新材料薄膜的品質與一致性，縮短客戶開發週期。
Currently in the industry, ALD can be used to manufacture high-dielectric films and related advanced transistors (such as GAA/CFET) in the process stage. In addition, ALD is applied to the protective layer during test piece preparation to avoid sample damage. This is a common practice in TEM analysis.然而，宜特的 ALD 能力並不僅止於此，而是進一步串接 「材料選擇 → 鍍膜製程 → 薄膜分析 → 製程驗證」，協助化學材料商、晶片製造商與設備供應商完成新材料驗證與最佳化，提供更完整的產業鏈 「材料端至晶片端」 之間的分析驗證。
iST stated that future semiconductor breakthroughs will not only come from process shrinkage, but also rely on the introduction of new materials. Through ALD new material verification, iST will assist the material and equipment supply chain to accelerate the definition of next-generation standards and become a key force in promoting the next 2-nanometer generation.且隨著半導體進入新材料時代，宜特透過 ALD 新材料驗證平台服務，將持續拓展「晶片驗證 + 新材料驗證」雙軌成長曲線，為客戶提供差異化解決方案，亦將成為推動宜特後續營運新引擎。
另外，宜特也公布 2025 年 10 月合併營收，金額為新台幣 3.93 億元，較2024 年同期成長 8.64%，較 9 月份減少 14.09%，為歷年同期新高。 The cumulative consolidated revenue in the first 10 months of 2025 is 4.005 billion yuan, an increase of 11.22% compared with the same period in 2024.
